Highly Manufacturable Deep (Sub-Millimeter) Etching Enabled High Aspect Ratio Complex Geometry Lego-Like Silicon Electronics Item Type Article Authors Ghoneim, Mohamed T.; Hussain, Muhammad Mustafa Citation Ghoneim MT, Hussain MM (2017) Highly Manufacturable Deep (Sub-Millimeter) Etching Enabled High Aspect Ratio Complex Geometry Lego-Like Silicon Electronics. Small: 1601801. Available: http://dx.doi.org/10.1002/smll.201601801. Eprint version Post-print DOI 10.1002/smll.201601801 Publisher Wiley Journal Small Rights This is the peer reviewed version of the following article: Highly Manufacturable Deep (Sub-Millimeter) Etching Enabled High Aspect Ratio Complex Geometry Lego-Like Silicon Electronics, which has been published in final form at http://doi.org/10.1002/ smll.201601801. This article may be used for non-commercial purposes in accordance With Wiley Terms and Conditions for self- archiving. Download date 28/05/2020 19:38:10 Link to Item http://hdl.handle.net/10754/622865