Contents lists available at ScienceDirect Thin Solid Films journal homepage: www.elsevier.com/locate/tsf Preface proceedings of the 7th International Conference on Microelectronics and Plasma Technology (ICMAP 2018), Incheon, Korea The International Conference on Microelectronics and Plasma Technology (ICMAP) was initiated in 2008 at Jeju, Korea, to provide an open forum for discussing research and developments in plasma-related fields. Since the first ICMAP in 2008, ICMAP 2009, 2011, 2012, 2014 and 2016 were held in Busan (Korea), Dalian (China), Jeju (Korea), Gunsan (Korea), and Geongju (Korea), respectively. ICMAP 2018 (July 24–28, Incheon, Korea) was held jointly with APCPST 2018 (The 14th Asia Pacific Conference on Plasma Science and Technology) and ISPB 2018 (The 8th International Symposium on Plasma Biosciences 2018). The conference, ICMAP 2018, was organized to discuss the state-of-the- art of scientific and technological achievements in plasma R&D activ- ities for advanced applications and the newly emerging fields of plasma technology. In ICMAP 2018, the topics included a variety of plasma processing technologies for thin films, nanomaterials, and atomic layer etching for semiconductor, display, energy, and sensor devices. In addition, the development of new plasma technologies including plasma farming, plasma medicine for skin and cancer applications, plasma biomaterials, and environment was extensively discussed. New plasma source tech- nology was an important topic for advanced applications. This Special Issue of Thin Solid Films contains peer-reviewed papers presented at ICMAP 2018 and selected from a total of 483 presentations including 121 invited talks, 65 contributed talks, and 297 posters. The organizing committee would like to express sincere thanks to organizing members, all institutions and companies that offered es- sential support and sponsorship, and all the participants contributing to the success of ICMAP 2018. Organizers The Korean Vacuum Society. Plasma Bioscience Research Center. Applied Plasma Medicine Center. Global Elite Cultivation Center for Emergent Materials (Brain Korea 21 + ). Sponsors Lam Research Corporation. SEMES. ICD Tokyo Electron (TEL), Co., Ltd. Jusung Engineering, Co., Ltd. KW Tech. WONIK IPS Co., Ltd. SNTEK Co., Ltd. Edwards Co., Ltd. The Korean Federation of Science and Technology Societies (KOFST). Incheon Metropolitan City. Incheon Tourism Organization. Korea Tourism Organization. Supporting organization American Vacuum Society. Plasma Technology Research Center at National Fusion Research Institute (NFRI). Honorary chairman Chi Kyu Choi, Jeju Nat'l Univ., Korea. Conference chairman Geun Young Yeom, Sungkyunkwan Univ., Korea. Suk Jae Yoo, Nat'l Fusion Research Inst., Korea. Eun Ha Choi, Kwangwoon Univ., Korea. General secretaries HeeHwan Choe, Korea Aerospace Univ., Korea. Shin Jae You, Chungnam Nat'l Univ., Korea. Deuk-Chul Kwon, Nat'l Fusion Research Inst., Korea. Hyo-Chang Lee, KRISS, Korea. Organizing committee Chi-Kyu Choi, Honorary Chair. Geun Young Yeom, Conference Chair. Suk Jae Yoo, Conference Chair. Eun Ha Choi, Conference Chair. Hong Young Chang, International Organizing Chair. J. E. Greene, International Advisory Committee Chair. https://doi.org/10.1016/j.tsf.2019.03.027 Thin Solid Films 680 (2019) 37–39 Available online 10 April 2019 0040-6090/ © 2019 Elsevier B.V. All rights reserved. T