ISSN 2347-3487 2074 | Page March 15, 2015 STRUCTURAL PROPERTIES OF NITROGEN DOPED ANATASE AND RUTILE TiO 2 THIN FILMS Asim Aijaz Department of Physics, University of Karachi, Main University Road, Karachi 75270, Sindh, Pakistan. aajaz@uok.edu.pk Zaheer Uddin Department of Physics, University of Karachi, Main University Road, Karachi 75270, Sindh, Pakistan. zuddin@uok.edu.pk Imran Ahmad Siddiqui Department of Physics, University of Karachi, Main University Road, Karachi 75270, Sindh, Pakistan. Imransid1@yahoo.com ABSTRACT Anatase and rutile TiO2 thin films have been doped by N ion implantation. The effect of N doping on the structural changes of TiO2 thin films and its correlation to the optical and chemical properties of the films is investigated. The depth and concentration of the implanted N atoms is found not to exhibit substantial difference for anatase and rutile phases. The energy loss of the implanted N atoms correlates well to the energy gained by O and Ti atoms in the TiO2 lattice. An increased number of O vacancies are found to be generated as compared to Ti for both anatase and rutile phases. The energy loss mechanisms of the implanted N atoms together with the O vacancy generation are found to be the major driving forces for facilitating enhanced optical and chemical properties of the TiO2 thin films. Indexing terms/Keywords Anatase and Rutile TiO2, Non-metal Doping, N Ion Implantation, Thin Film Growth, Optical and Chemical Properties Academic Discipline And Sub-Disciplines Science; Physics SUBJECT CLASSIFICATION Materials Physics; Thin Film Physics TYPE (METHOD/APPROACH) Monte Carlo based simulation and modeling Council for Innovative Research Peer Review Research Publishing System Journal: JOURNAL OF ADVANCES IN PHYSICS Vol.8, No.2 www.cirjap.com , japeditor@gmail.com