870 IEEE ELECTRON DEVICE LETTERS, VOL. 29, NO. 8, AUGUST 2008
Behaviors of Emission Wavelength Shift in
AlInGaN-Based Green Laser Diodes
Sung-Nam Lee, H. Y. Ryu, H. S. Paek, J. K. Son, Y. J. Sung, K. S. Kim,
H. K. Kim, H. Kim, T. Jang, K. H. Ha, O. H. Nam, and Y. Park
Abstract—InGaN quantum-well (QW) green laser diodes (LDs)
with an emission wavelength of 483.7 nm were characterized by
controlling the injection pulsewidth. The emission wavelength of
LDs showed a large blueshift (> 20 nm) of spontaneous emission
peak with increasing injection current below the threshold cur-
rent. The huge blueshift was ascribed to the deep In localization
states and the strong piezoelectric field in the green InGaN QW
structure with higher In contents than conventional violet/blue
InGaN QWs. However, the lasing wavelength of LDs was slightly
redshifted by increasing the injection pulsewidth due to the ther-
mal heating effects.
Index Terms—Gallium compounds, GaN, laser diode (LD),
light-emitting diodes (LEDs), quantum well (QW), semiconductor
lasers.
B
LUE-VIOLET laser diodes (LDs) with InGaN multiple-
quantum-well (MQW) structure have been commercial-
ized as a light source for next-generation digital versatile disk
systems [1]–[3]. Additionally, blue InGaN LDs with an emis-
sion wavelength of near 450 nm have been developed for the
blue light sources of laser projection display systems and high-
resolution printers [3], [4]. However, there are serious problems
in achieving full-color laser display systems of smaller size and
lower power consumption due to the absence of green LDs
that are as small as blue/red LDs. Therefore, GaN-based green
LDs should be developed to replace bulk-state lasers, such as
Ar-gas and frequency-doubled green lasers. However, in spite
of the significant improvement in LD structures with InGaN ac-
tive material quality by the optimization of growth conditions,
there are still important issues in achieving a lasing wavelength
that is longer than 500 nm due to In phase separation, strain-
induced piezoelectric field, etc. [5]–[13].
Because of the solid-phase immiscibility in the InGaN–GaN
material system, the phase separation was expected to be a
Manuscript received April 29, 2008; revised May 23, 2008. The review of
this letter was arranged by Editor C. Jagadish.
S.-N. Lee, H. S. Paek, J. K. Son, Y. J. Sung, K. S. Kim, H. K. Kim,
H. Kim, T. Jang, and Y. Park are with the OS Laboratory, Corporate
R&D Institute, Samsung Electro-Mechanics Co., Ltd., Suwon 443-743, Korea
(e-mail: snlee@samsung.com; Paek@sm.not; jkson@sm.not; sung@sm.not;
kskim@sm.not; hkkim@sm.not; hs20.kim@samsung.com; tjang@sm.not;
ypark@sm.not).
H. Y. Ryu is with the Department of Physics, Inha University, Incheon
402-751, Korea (e-mail: hanryu@inha.ac.kr).
K. H. Ha is with the Semiconductor Device Laboratory, Samsung Advanced
Institute of Technology, Suwon 440-600, Korea (e-mail: khha@sm.not).
O. H. Nam is with the Department of Nano-Optical Engineering, Korea
Polytechnic University, Siheung 429-793, Korea (e-mail: ohnam@kpu.ac.kr).
Color versions of one or more of the figures in this letter are available online
at http://ieeexplore.ieee.org.
Digital Object Identifier 10.1109/LED.2008.2001081
significant problem in the growth of a typical InGaN epitaxial
layer according to theoretical studies by Ho and Stringfellow
[11]. To achieve the green emission, InGaN MQWs should be
obtained by higher In content than 20%. Accordingly, In phase
separation is easily generated in an InGaN green active layer,
resulting in the degradation of emission efficiency and the large
blueshift. These are caused by the inhomogeneous emission
and the band-filling effect, respectively [12], [13]. The built-
in polarization-induced electric field limits the performance
of optical devices due to the strong polarization properties
of III-nitrides [8]–[10]. Specifically, the spatial separation of
the electron and hole wave functions caused by the quantum-
confined Stark effect reduces the oscillator strength of transition
and recombination efficiency in the InGaN QW structure [9].
In this letter, we demonstrated the AlInGaN-based green LDs
with the InGaN single-QW structure by optimizing growth
parameters and structure optimizations.
LD structures including clad, waveguide, QW, and electron
blocking layer were grown on freestanding GaN substrates
by metal–organic chemical vapor deposition. The dislocation
density of the freestanding GaN substrates was as low as
5 × 10
6
/cm
2
. The active layer consisted of a 20-Å In
x
Ga
1−x
N
QW separated by 150-Å In
y
Ga
1−y
N barriers, where the x and
y were chosen to be 25% and 2%, respectively, for an emission
wavelength of ∼500 nm. To increase the optical confinement
factor, an 80-nm-thick In
0.01
Ga
0.99
N double optical confine-
ment layer (OCL) structure was introduced around the InGaN
single-QW structure. As an electron blocking layer between
the upper InGaN OCL and the p-type GaN, AlGaN/GaN mul-
tiquantum barriers were grown to efficiently suppress electron
overflow to p-type doped layers [3]. LD devices were fabricated
as follows: A ridge waveguide LD was fabricated with a width
of 2.5 μm and a cavity length of 650 μm. Pd/Ti/Pt/Au and
Pd/Ti/Al/Ti ohmic contacts were formed on p-type and n-type
GaN, respectively. Mirror facets were prepared by cleaving
process, and highly reflective multilayer films were coated on
the front facet of 95% and the rear facet of 99%. A schematic
structure of the green LD grown on GaN substrate is shown
in Fig. 1.
The LDs have been characterized under pulse operation
modes at room temperature. Fig. 2 showed that the light output
power and the operation voltage were plotted as a function of
the injection current. The peak wavelength of the lasing emis-
sion was observed at 483.7 nm, which was one of the longest
lasing wavelength spectra with the single-mode operation of
AlInGaN-based LDs, to our knowledge. The threshold current
and the threshold voltage were 95 mA and 6.17 V, respectively,
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