Photochemically deposited and post annealed copper indium disulphide thin films R. Suriakarthick a , V. Nirmal Kumar a,b , R. Indirajith c , T.S. Shyju d , R. Gopalakrishnan a,⇑ a Crystal Research Lab, Department of Physics, Anna University, Chennai 600025, India b Research Institute of Electronics, GSST, Shizuoka University, Hamamatsu, Japan c Department of Physics, B.S. Abdhur Rahman University, Chennai 600048, India d Centre for Nano Science, Sathyabama University, Chennai 600119, India article info Article history: Received 17 June 2014 Received in revised form 20 August 2014 Accepted 23 August 2014 Available online 16 September 2014 Keywords: Photochemical deposition Copper indium disulfide Post annealing Microstructure abstract Copper indium disulfide (CIS) thin films were deposited using novel photochemical deposition (PCD) technique by selective deposition parameters. In this work CIS film deposition was made by cationic, anionic precursor solution concentration ratio 1:1:2. Na 2 EDTA was used as a chelating agent. The as deposited CIS films were post annealed at different temperatures up to 400 °C in vacuum. The as deposited and annealed CIS films were examined to reveal the structural, optical, morphological, compositional and electrical properties by X-ray diffraction, Raman analysis, UV–Vis spectros- copy, Scanning Electron Microscopy, TEM, EDX and Hall effect respectively. From the XRD and Raman studies the Cu–Au ordering was confirmed both in as deposited and annealed films. The crystal- lite size increases with increasing of annealing temperature and the surface structuring shows rod like microstructure. Ó 2014 Elsevier Ltd. All rights reserved. 1. Introduction Energy demand arises due to the needs higher than its production. Hence, we need electrical energy from economical and ecofriendly way. Production of electrical energy from renewable energy http://dx.doi.org/10.1016/j.spmi.2014.08.012 0749-6036/Ó 2014 Elsevier Ltd. All rights reserved. ⇑ Corresponding author. Tel.: +91 044 2235 8710x8707; fax: +91 044 2235 8700. E-mail address: krgkrishnan@yahoo.com (R. Gopalakrishnan). Superlattices and Microstructures 75 (2014) 667–679 Contents lists available at ScienceDirect Superlattices and Microstructures journal homepage: www.elsevier.com/locate/superlattices