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Extremely Low Dark Current MoS
2
Photodetector via 2D
Halide Perovskite as the Electron Reservoir
Haoliang Wang, Xudong Wang, Yan Chen, Shukui Zhang, Wei Jiang, Xin Zhang,
Jiajun Qin, Jiao Wang, Xiaoguo Li, Yiyi Pan, Fengcai Liu, Zejiao Shi, Haijuan Zhang,
Luqi Tu, Hailu Wang, Huabao Long, Dapeng Li, Tie Lin, Jianlu Wang,* Yiqiang Zhan,*
Hong Shen,* Xiangjian Meng, and Junhao Chu
DOI: 10.1002/adom.201901402
1. Introduction
2D transition metal dichalcogenides
(TMDs) have attracted enormous attention
due to their novel and outstanding optoe-
lectronic properties in the past few years.
[1]
Among them, MoS
2
has been extensively
studied because of its atomic-thin struc-
ture, high quantum efficiency, decent
carrier mobility, and thickness-dependent
tunable bandgap.
[2–4]
With these novel
properties, MoS
2
is considered to be a
competitive candidate for the application
in the next-generation photodetectors.
Early works revealed capability of dif-
ferent layers MoS
2
for the photon detec-
tion,
[5–8]
and proved that the bandgap of
MoS
2
was highly related to the thickness
at a variable range from 1.2 to 1.8 eV.
[9,10]
Multilayer MoS
2
flakes have a narrower
bandgap and could provide a wider spec-
tral detection range (from ultraviolet
(UV) to near-infrared (NIR)) than mon-
olayer MoS
2
. For the light detection application, a wider spec-
trum response means the ability to be compatible with more
complicate light-detection scenarios. In addition, it is gener-
ally believed thick multilayer MoS
2
gains better light absorp-
tion compared to atomic-thin monolayer MoS
2
.
[1,4–6]
The
wider detection range and better light absorption ability have
made the multilayer MoS
2
a great candidate for a broad detec-
tion range, high-performance photodetector. However, there
are still some drawbacks that limit the further applications
of multilayer MoS
2
photodetectors. Compared to monolayer
MoS
2
, multilayer MoS
2
has better electric conductance, which
results in a large dark current.
[6,7]
Dark current, usually consid-
ered as noise, is an important parameter to evaluate the per-
formance of a photodetector.
[2]
Almost all the main parameters
such as responsivity (R), detectivity (D*), and photoswitching
on/off ratio are related to the dark current. Large dark current
in multilayer MoS
2
photodetectors became a major issue and
hindered its further development. To suppress the dark cur-
rent, the traditional method is to fabricate the three-terminal
photodetectors (source, drain, and gate) and apply the gate
bias to control the carrier density in the channel.
[5–8]
But com-
pared to two-terminal device, the three-terminal devices make
Toward pursuing high-performance photodetectors based on 2D transition
metal dichalcogenides (TMDs) such as molybdenum disulfide (MoS
2
), it is
desirable to reduce the high dark current and sluggish response time.
Here, in multilayer MoS
2
-based photodetectors, a 2D halide perovskite,
(C
6
H
5
C
2
H
4
NH
3
)
2
PbI
4
((PEA)
2
PbI
4
), is introduced as a bifunctional material: both
as electron reservoir to reduce free carriers and passivation agent to passivate
defects. Surprisingly, dark current is suppressed by six orders of magnitude after
coating a (PEA)
2
PbI
4
thin layer onto pristine MoS
2
photodetector, with the dark
current decreased to 10
-11
A. This huge reduction of dark current suggests an effi-
cient interlayer charge transfer from MoS
2
to (PEA)
2
PbI
4
, which is further verified
by photoluminescence quenching phenomenon. It indicates that (PEA)
2
PbI
4
serves as electron reservoir to reduce carrier density of MoS
2
, resulting in ultrahigh
detectivity (1.06 × 10
13
Jones). Moreover, the response speed is also accelerated
by more than 100-fold due to passivation by 2D perovskite. In addition, it is found
that this type of photodetectors can further work at self-power mode (with the bias
of 0 V). Therefore, the strategy of applying 2D perovskite on the surface of TMDs
provides a novel way to fabricate high-performance photodetectors.
Dr. H. Wang, Dr. X. Wang, Dr. Y. Chen, Dr. S. Zhang, Dr. W. Jiang,
Dr. L. Tu, Dr. H. Wang, Prof. T. Lin, Prof. J. Wang, Prof. H. Shen,
Prof. X. Meng, Prof. J. Chu
State Key Laboratory of Infrared Physics
Shanghai Institute of Technical Physics
Chinese Academy of Sciences
500 Yu Tian Road, Shanghai 200083, China
E-mail: jlwang@mail.sitp.ac.cn; hongshen@mail.sitp.ac.cn
Dr. X. Zhang
Academy for Engineering and Technology
Fudan University
Shanghai 200433, China
Dr. J. Qin, Prof. J. Wang, Dr. X. Li, Dr. Y. Pan, Dr. F. Liu, Dr. Z. Shi,
Dr. H. Zhang, Prof. Y. Zhan
Center of Micro-Nano System
SIST
Fudan University
Shanghai 200433, China
E-mail: yqzhan@fudan.edu.cn
Prof. H. Long, Prof. D. Li
Shanghai Aerospace Control Technology Institute
1555 Zhong Chun Road, Shanghai 201109, China
The ORCID identification number(s) for the author(s) of this article
can be found under https://doi.org/10.1002/adom.201901402.
Adv. Optical Mater. 2020, 1901402