S 1 Hexacene Generated on Passivated Silicon Frank Eisenhut, 1,2 Justus Krüger, 1,2 Dmitry Skidin, 1,2 Seddigheh Nikipar, 1,2 José M. Alonso, 3 Enrique Guitián, 3 Dolores Pérez, 3 Dmitry A. Ryndyk, 1,3 Diego Peña,* ,2 Francesca Moresco,* ,2,1 and Gianaurelio Cuniberti 1,2,4 1 Institute for Materials Science and Max Bergmann Center of Biomaterials, TU Dresden, 01062 Dresden, Germany 2 Center for Advancing Electronics Dresden, TU Dresden, 01062 Dresden, Germany 3 Centro de Investigación en Química Biolóxica e Materiais Moleculares (CIQUS) and Departamento de Química Orgánica, Universidade de Santiago de Compostela, 15782-Santiago de Compostela, Spain 4 Bremen Center for Computational Materials Science (BCCMS), Universität Bremen, 28359 Bremen, Germany 5 Dresden Center for Computational Materials Science (DCMS), TU Dresden, 01069 Dresden, Germany *Corresponding authors: francesca.moresco@tu-dresden.de diego.pena@usc.es Electronic Supplementary Material (ESI) for Nanoscale. This journal is © The Royal Society of Chemistry 2018